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贸易摩擦背景下美国在华专利布局与中美技术竞争
引用本文:蔡中华,马欢.贸易摩擦背景下美国在华专利布局与中美技术竞争[J].知识产权,2021(2):87-96.
作者姓名:蔡中华  马欢
作者单位:北京化工大学经济管理学院;国家知识产权局专利局
摘    要:围绕日趋激烈的中美科技竞争,本文使用WIPO专利申请数据,对美国在华专利布局的演进特征和优势领域进行了实证分析,并构造技术相似度指数衡量中美在我国市场的技术竞争程度。结果显示:美国在华专利申请保持年均10%的快速增长并呈现明显的阶段性攀升,形成了一批以生物技术和信息技术为代表的稳定优势技术领域。美国企业更加重视在科学密集型子领域的专利布局,通过这些领域的技术优势支撑了美国在高技术产业重点领域对我国的贸易顺差。以技术相似度指数测算,美国在华技术布局与中国自主技术布局的整体相似程度呈"V"型演化关系,从技术互补逐渐转向技术竞争,2010年后两国技术相似度维持高位,技术竞争呈常态化白热化局面。

关 键 词:中美贸易摩擦  知识产权  技术相似度  专利申请  技术竞争

The US Patent Layout in China and Sino-US Technology Competition Against the Backdrop of Trade Conflict
Cai Zhonghua,Ma Huan.The US Patent Layout in China and Sino-US Technology Competition Against the Backdrop of Trade Conflict[J].Intellectual Property,2021(2):87-96.
Authors:Cai Zhonghua  Ma Huan
Abstract:In view of the phenomenon of science and technology competition,based on WIPO’s patent application data,this paper makes an empirical analysis on the evolution characteristics and advantage areas of the U.S.technology layout in China,and constructs a technology proximity index to measure the degree of technological competition between Chinese and U.S.enterprises in China’s market.The results show that the average annual growth rate of American patent applications in China is 10%,and a number of sub-technology fields with stable comparative advantages are formed,represented by biotechnology and computer technology.U.S.enterprises have paid more attention to the technology layout in science-intensive sub-fields,and the technological advantages in these fields have supported the U.S.trade surplus in key fields of China’s high-tech products.Measured by the technology similarity index,the overall similarity of the US technology layout in China and China’s independent technology layout presents a V-shaped evolutionary relationship,from technology complementation to technology competition gradually.In recent years,the technological similarity between the two countries has remained high,and the technological competition between the two countries has become increasingly serious.
Keywords:Sino-US trade conflicts  intellectual property  technology proximity index  patent application  technology competition
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